One of the greatest challenges in semiconductor manufacturing is surface contamination of silicon wafers, and semiconductor cleaning is one of the most critical steps in the semiconductor process. As an important part of semiconductor processing, wet processes use chemicals (acids, alkalis, solvents, etc.) and liquid media such as ultrapure water to etch and clean wafer surfaces. Voir SCU® filtration membranes and filter assemblies can efficiently retain contaminants in common cleaning liquids such as SC1, SC2, 49HF, HNO3, EKC and SPM.
Capable of capturing particles in the nanometer range
Maintains a superior flow rate
Filtration under various strongly acidic, strongly alkaline and strongly oxidizing conditions
Resistant to temperature difference and corrosion
Extensive field test data
Self-developed filtration media with high consistency
Choice of hydrophilic and hydrophobic filtration media
Various pore sizes available (10 nm to 1 μm); membranes finer than 10 nm can be customized
Filter
Filtration Membrane
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